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Gold Shuttle: Difference between revisions

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Created page with "Goal: run an MVP shuttle run and bring wafers to open sauce 2026 == Previous work == none|thumb none|thumb Above: IIRC used this, but a UVC PR would probably also work Equipment used: * Maasi spin coater ** Production used 2, but you can get away with 1 ** Production configuration: 1 for cleaning, 1 for PR * "ez bake lithography" exposure machine * Masks ** 3d printed frame + transparency * Printer ** I used a las..."
 
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Goal: run an MVP shuttle run and bring wafers to open sauce 2026
Goal: run an MVP shuttle run and bring wafers to open sauce 2026
TODO:
* Document existing fabrication process better
* Set back up in SF
** Grab ez bake litho system out of storage
** Acquire lab space (WIP)
** Fix sputter coater
* Measure maximum resolution
* Make PDK
* Wafer floorplan
** Probably 3x3
* Solicit first cohort of contributors
** Start by sourcing from FOSSF discord


== Previous work ==
== Previous work ==

Latest revision as of 22:09, 20 March 2026

Goal: run an MVP shuttle run and bring wafers to open sauce 2026

TODO:

  • Document existing fabrication process better
  • Set back up in SF
    • Grab ez bake litho system out of storage
    • Acquire lab space (WIP)
    • Fix sputter coater
  • Measure maximum resolution
  • Make PDK
  • Wafer floorplan
    • Probably 3x3
  • Solicit first cohort of contributors
    • Start by sourcing from FOSSF discord

Previous work

Above: IIRC used this, but a UVC PR would probably also work


Equipment used:

  • Maasi spin coater
    • Production used 2, but you can get away with 1
    • Production configuration: 1 for cleaning, 1 for PR
  • "ez bake lithography" exposure machine
  • Masks
    • 3d printed frame + transparency
  • Printer
    • I used a laser printer

Simple / existing gold fabrication process:

  • Mask fabrication
    • Laser printer a couple of times through onto transparency
    • Cut to size
  • Clean 2" wafer
    • Strip photoresist by leaving it in for longer
    • Clean with IPA and spin at max speed (8k RPM)
    • Sometimes lightly brushed wafer when needed
  • Sputter coat gold
  • Spin coat PR
  • Expose mask
  • Develop PR using KOH
  • Etch gold using NaI/I
  • Clean wafer
  • Place into membrane box


Mask exposure using "ez bake lithography"

Some early notes from that can be found here

There are